| Chip | Year | Process (µm) | Epi.(µm) | Pitch (µm) | Metal | pixels | Peculiar | Documents | |
| M1 | 1999 | AMS 0.6 | 14 | 20 | 3M | 4k | thick epitaxy | ||
| M2 | 2000 | MIETEC 0.35 | 4.2 | 20 | 5M | 4k | thin epitaxy | ||
| M3 | 2001 | IBM 0.25 | 2 | 8 | 3M | 32k | deep sub-mm | ||
| M4 | 2001 | AMS 0.35 | no | 20 | 3M | 4k | low dop. Substrate | ||
| M5 | 2001 | AMS 0.6 | 14 | 17 | 3M | 1M | real scale 1M pixels | ||
| M6 | 2002 | AMIS 0.35 | 4.2 | 28 | 5M | 3k | fast col. // r.o. and integrated spars. | ||
| M7 | 2003 | AMS 0.35 | no | 25 | 4M | 1k | fast col. // r.o. + integ. spars. (photoFET) | ||
| M8 | 2003 | TSMC 0.25 | ~8 | 25 | 5M | 4k | fast col. // r.o. and integrated spars. | ||
| M9 | 2004 | AMS 0.35 opto | ~14 | 20/30/40 | 4M | 7k | tests diodes/pitch/leakage current | ||
| M9 no epi | 2004 | AMS 0.35 opto | no | 20/30/40 | 4M | 7k | tests diodes/pitch/leakage current | ||
| M10 Star 1 | 2004 | TSMC 0.25 | ~8 | 30 | 3M | 16k | 1st proto. for STAR vtx det. upgrade | ||
| M11 | 2005 | AMS 0.35 opto | ~14 | 30 | 3M | 7k | rad.tol. struct. | ||
| M12 Mosaic 1 | 2005 | AMS 0.35 hires | no | 35 | 4M | 0.6k | multi-memory pixels (FAPS) | ||
| M13 Mosaic 2 | 2005 | AMS 0.35 hires | no | 20 | 4M | 1.4k | fast col. // r.o. | ||
| M14 Star 2 | 2005 | AMS 0.35 opto | no | 30 | 4M | 16k | final proto. STAR vtx det. upgrade | ||
| M15 | 2005 | AMS 0.35 opto | ~14 | 20/30 | 4M | 7k | multi-purpose tracker-imager | ||
| SUC 1 | 2003 | AMIS 0.35 | 4.2 | 25-35 | 5M | 4k | rad.tol. struct. (SUCIMA project) | ||
| SUC 2 | 2003 | AMS 0.35 | no | 40 | 3M | 2k | low dop. Substrate (SUCIMA project) | ||
| SUC 3 | 2003 | AMIS 0.35 | 4.2 | 20 | 5M | 8k | rad.tol. struct. (SUCIMA project) | ||
| SUC 4 Mtera | 2004 | AMS 0.35 | 14 | 150 | 3M | 12.5k | hadrontherapy/beam monitor. (SUCIMA) | ||
| SUC 5 | 2004 | AMIS 0.35 | 4.2 | 30 | 5M | 65k | proto. Dosimetry (SUCIMA project) |